Atomic Layer Deposition

atomic_layer_depositionAtomic Layer Deposition

Manufacturer: Kurt J. Lesker

Model: ALD-150LE

Purpose: Thermal atomic layer deposition

Specifications:

      • Up to 150mm wafers
      • Manual loading
      • Al2O3 films
      • trimethylaluminum and water
      • 330鈥
      • Growth Rate is 0.85A per cycle
      • Cycle time of 30 seconds
      • Expansion capability for additional precursors, enabling different films